Display apparatus and method of manufacturing the same

ABSTRACT

A display apparatus includes a base substrate, a pixel electrode, a plurality of capsular structures, a common electrode and a plurality of color filters. The base substrate includes a plurality of unit pixel regions. Each of the unit pixel regions has a plurality of sub pixel regions. A pixel electrode is formed in each of the sub pixel regions. A plurality of capsular structures is disposed on the base substrate. Each of the capsular structures is formed in each of the unit pixel regions and having a cavity. A common electrode is formed on the capsular structures. A plurality of color filters is formed on the capsular structures. Each of the color filters is formed in each of the sub pixel regions. An opening ratio of the sub pixel regions and light transmittance are relatively high.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims priority under 35 U.S.C. §119 to Korean PatentApplication No. 10-2012-0005733, filed on Jan. 18, 2012 in the KoreanIntellectual Property Office (KIPO), the contents of which areincorporated by reference herein in its entirety.

TECHNICAL FIELD

Exemplary embodiments of the present invention relate to a displayapparatus. More particularly, exemplary embodiments of the presentinvention relate to a display apparatus and a method of manufacturingthe display apparatus.

DISCUSSION OF THE RELATED ART

Generally, a liquid crystal display (LCD) apparatus includes a displaysubstrate, a counter substrate and a liquid crystal layer interposedbetween the display substrate and the counter substrate. The displaysubstrate includes a plurality of gate lines, a plurality of sourcelines, a plurality of thin film transistors and a plurality of pixelelectrodes. The source lines cross the gate lines. The thin filmtransistors are connected to the gate and source lines. The pixelelectrodes are connected to the thin film transistors. Each of the thinfilm transistors includes a gate electrode, a channel, a sourceelectrode and a drain electrode. The channel is overlapped with the gateelectrode. The source electrode is extended from the source line and iselectrically connected to the channel. The drain electrode is spacedapart from the source electrode and is electrically connected to thechannel. The counter substrate includes a common electrode. An electricfield is formed between the pixel electrodes and the common electrode.

SUMMARY

Exemplary embodiments of the present invention provide a displayapparatus having improved opening ratio.

Exemplary embodiments of the present invention also provide a method ofmanufacturing the above-mentioned display apparatus.

According to an exemplary embodiment of the present invention, a displayapparatus includes a base substrate, a pixel electrode, a plurality ofcapsular structures, a common electrode and a plurality of colorfilters. The base substrate includes a plurality of unit pixel regions.Each of the unit pixel regions has a plurality of sub pixel regions. Apixel electrode is formed in each of the sub pixel regions. A pluralityof capsular structures is disposed on the base substrate. Each of thecapsular structures is formed in each of the unit pixel regions andhaving a cavity. A common electrode is formed on the capsularstructures. A plurality of color filters is formed on the capsularstructures. Each of the color filters is formed in each of the sub pixelregions.

In an exemplary embodiment, the display apparatus may further include alight blocking pattern formed between adjacent color filters.

In an exemplary embodiment, the light blocking pattern may includeopaque organic material.

In an exemplary embodiment, the light blocking pattern may be disposedon the color filters.

In an exemplary embodiment, the light blocking pattern may include afirst black matrix and a second black matrix. The first black matrix maybe interposed between adjacent capsular structures, and partiallyoverlapped with the color filters. The first black matrix may bedisposed under the color filters. The second black matrix may be formedon the capsular structures, and may be partially overlapped with thecolor filters. The second black matrix may be disposed on the colorfilters.

In an exemplary embodiment, the light blocking pattern may be interposedbetween the capsular structures and the base substrate.

In an exemplary embodiment, the light blocking pattern may includemetal.

In an exemplary embodiment, the sub pixel regions in each of the unitpixel regions may be arranged in a first direction, and the commonelectrode may be extended in the first direction and arranged in thesecond direction.

In an exemplary embodiment, a portion of the capsular structuresadjacent to each other in the first direction may be connected to eachother, and a portion of the capsular structures adjacent to each otherin the second direction may be spaced apart from each other.

In an exemplary embodiment, the display apparatus may further include analignment layer and a liquid crystal layer. The alignment layer may bedisposed on an upper surface of the cavity. The liquid crystal layer maybe disposed in the cavity and aligned by the alignment layer.

In an exemplary embodiment, the display apparatus may further include aprotecting layer sealing the liquid crystal layer.

According to an exemplary embodiment of the present invention, a methodof manufacturing a display apparatus is provided as follows. A pluralityof pixel electrodes is formed in a plurality of sub pixel regions of abase substrate. A removing pattern is formed in each of a plurality ofunit pixel regions. Each of the unit pixel regions has a plurality ofthe sub pixel regions. The removing pattern has substantially the samewidth as the unit pixel region. The removing pattern is extended in alongitudinal direction the crosses a horizontal direction of the unitpixel region. A plurality of capsular structures and a common electrodeare formed on the removing pattern. The capsular structures are extendedin a width direction of the removing pattern and spaced apart from eachother in the longitudinal direction of the removing pattern. Theremoving patterns are removed forming cavities in the capsularstructures. A liquid crystal layer is formed in the cavities of thecapsular structures. A protecting layer is formed and seals the liquidcrystal layer in the cavities of the capsular structures.

In an exemplary embodiment, the method may further include forming aplurality of color filters on the capsular structures corresponding tothe sub pixel regions, respectively.

In an exemplary embodiment, the method may further include forming alight blocking pattern between adjacent color filters having differentcolors.

In an exemplary embodiment, the light blocking pattern may includeopaque organic material.

In an exemplary embodiment, the light blocking pattern may be formed onthe color filters, and partially overlapped with the color filters.

In an exemplary embodiment, the light blocking pattern may be formed byforming first and second black matrixes. Prior to forming the colorfilters, the first black matrix may be formed between adjacent capsularstructures. After forming the color filters, the second black matrix maybe formed on the capsular structures.

In an exemplary embodiment, the method may further include a lightblocking pattern, prior to forming the pixel electrodes.

In an exemplary embodiment, the light blocking pattern may includemetal.

In an exemplary embodiment, the method may further include forming analignment layer in the cavities of the capsular structures, and forminga light crystal layer in the cavities in which the alignment layer isformed.

In an exemplary embodiment of the present invention, a display apparatusincludes a base substrate. A plurality of unit pixel regions is definedon the base substrate. A plurality of pixel electrode corresponds to theplurality of unit pixel regions. Each of the unit pixel regions has aplurality of sub pixel regions. A plurality of capsular structures isdisposed on the base substrate. Each capsular structure of the pluralityof capsular structures is formed in each of the plurality of unit pixelregions. Each capsular structure of the plurality of capsular structureshas a cavity, a common electrode formed on the plurality of capsularstructures, and a plurality of color filters formed on the plurality ofcapsular structures. Each of the color filters of the plurality of colorfilters being formed in each of the sub pixel regions of the pluralityof sub pixel regions.

According to the display apparatus and the method of manufacturing thedisplay apparatus, each of the capsular structures is formed on aplurality of the sub pixel regions so that opening ratio is increased.Thus, light transmittance and luminance of the display apparatus may beincreased.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other features and aspects of the present invention willbecome more apparent by describing in detailed exemplary embodimentsthereof with reference to the accompanying drawings, in which:

FIG. 1 is a partially cut out perspective view illustrating a displayapparatus according to an exemplary embodiment of the present invention;

FIG. 2 is a cross-sectional view taken along a line I-I′ shown in FIG.1;

FIGS. 3A to 3E are cross-sectional views illustrating a method ofmanufacturing the display apparatus shown in FIGS. 1 and 2;

FIG. 4A is a cross-sectional view illustrating a display apparatus andlight transmittance of the display apparatus according to an exemplaryembodiment of the present invention;

FIG. 4B is a cross-sectional view illustrating the display apparatusshown in FIGS. 1 and 2 and light transmittance of the display apparatusshown in FIGS. 1 and 2;

FIG. 5 is a cross-sectional view illustrating a display apparatusaccording to an exemplary embodiment of the present invention;

FIGS. 6A and 6B are cross-sectional views illustrating the displayapparatus shown in FIG. 5;

FIG. 7 is a cross-sectional view illustrating a display apparatusaccording to an exemplary embodiment of the present invention; and

FIGS. 8A to 8C are cross-sectional views illustrating the displayapparatus shown in FIG. 7.

DETAILED DESCRIPTION

Hereinafter, exemplary embodiments of the present invention will beexplained in detail with reference to the accompanying drawings.

FIG. 1 is a partially cut out perspective view illustrating a displayapparatus according to an exemplary embodiment of the present invention.FIG. 2 is a cross-sectional view taken along a line I-I′ shown in FIG.1.

Referring to FIGS. 1 and 2, the display apparatus includes a basesubstrate 101, a thin film transistor (TFT) array layer 120, a capsularstructure layer 130, a color filter layer 140 and a protecting layer150. The TFT array layer 120, the capsular structure layer 130, thecolor filter layer 140 and the protecting layer 150 are formed on thebase substrate 101.

The TFT array layer 120 includes a plurality of gate lines GL, aplurality of date lines DL, a plurality of switching elements TR and aplurality of pixel electrodes PE.

The gate lines GL are extended in a first direction D1, and are arrangedin a second direction D2 that crosses the first direction D1. The gatelines GL are electrically connected to gate electrodes GE of theswitching elements TR.

The data lines DL are extended in the second direction D2 and arearranged in the first direction D1 that crosses the second direction D2.The data lines DL are electrically connected to source electrodes SE ofthe switching elements TR.

Each of the switching elements TR includes the gate electrode GE, thesource electrode SE and a drain electrode DE. The gate electrode GE iselectrically connected to one of the gate lines GL. The source electrodeSE is electrically connected to one of the data lines DL. The drainelectrode DE is spaced apart from the source electrode DW. The drainelectrode DE of the switching element TR is electrically connected toone of the pixel electrodes PE through a contact hole CH.

Each of the pixel electrodes PE is disposed in each of sub pixelregions, and is electrically connected to each of the switching elementsTR. The base substrate 101 has a plurality of unit pixel regions PUA.Each of the unit pixel regions PUA has a plurality of sub pixel regionsPA1, PA2 and PA3. For example, each of the unit pixel regions PUA mayhave three sub pixel regions PA1, PA2 and PA3. In FIGS. 1 and 2, theunit pixel region PUA includes a first sub pixel region PA1, a secondsub pixel region PA2 and a third sub pixel region PA3. A first sub pixelelectrode PE1 is disposed in the first sub pixel region PA1. A secondsub pixel electrode PE2 is disposed in the second sub pixel region PA2.A third sub pixel electrode PE3 is disposed in the third sub pixelregion PA3.

The sub pixel regions PA may be arranged in a matrix shape having aplurality of columns and rows. Each of the sub pixel regions PA may havea width side and a longitudinal side. For example, the width side andthe longitudinal side of the sub pixel region PA may be substantiallyparallel with the first and second directions, respectively.Alternatively, the sub pixel regions PA may have various shapes andarrangements. The sub pixel regions PA may have a square shape, acircular shape, an elliptical shape, a stripe shape, a V-shape, Z-shape,etc.

For example, the display apparatus may be a transmissive type displayapparatus, and the pixel electrodes PE may include transparentconductive material. The liquid crystal layer may include liquid crystalmolecules. In an exemplary embodiment, the display apparatus may be areflective type display apparatus and the pixel electrodes PE mayinclude opaque conductive material. The liquid crystal layer may besubstituted by an electrophoretic display apparatus, an organic lightemitting display (OLED) apparatus, etc. Alternatively, the liquidcrystal layer may be substituted by oil, hydrophobic material, orhydrophilic material.

The TFT array layer 120 may further include a first insulating layer121, a second insulating layer 123 and a third insulating layer 125. Thefirst insulating layer 121 is formed on the base substrate 101 coveringthe gate lines GL and the gate electrodes GE that are formed from afirst metal layer. The second insulating layer 123 is formed on the basesubstrate and covers the data lines DL, the source electrodes SE and thedrain electrodes DE that are formed from a second metal layer. The thirdinsulating layer 125 is formed on the base substrate 101 and covers thepixel electrodes PE. The first, second and third insulating layers 121,123 and 125 may include silicon nitride (SiNx), silicon oxide (SiOx),etc. The first, second and third insulating layers 121, 123 and 125 mayhave a single layered structure or a multi layered structure formed fromdifferent materials and using different processes.

The capsular structure layer 130 may include a plurality of capsularstructures 131, an alignment layer 132, a liquid crystal layer 133 and acommon electrode CE.

Each of the capsular structures 131 may have a cavity in the form of atunnel shape, and may be arranged in each of the unit pixel regions PUA.The capsular structure 131 may have a single layered structure havingsilicon nitride SiNx. Alternatively, the capsular structure 131 may havea multi layered structure formed from different materials and usingdifferent processes.

For example, the capsular structures 131 may be extended in the firstdirection D1 and arranged in the second direction D2. In FIGS. 1 and 2,the capsular structures 131 may be spaced apart from each other in thesecond direction D2. Width and length of each of the capsular structures131 may be substantially parallel with the first direction D1 and thesecond direction D2, respectively. The width of the capsular structure131 may correspond to a summation of widths of the first, second andthird sub pixel regions PA1, PA2 and PA3. The length of the capsularstructure 131 may correspond to a length of each of the first, secondand third sub pixel regions PA1, PA2 and PA3. The capsular structures131 are spaced apart from each other in the second direction D2, so thatthe alignment layer 132 and the liquid crystal layer 133 may be formedin the cavities of the capsular structures 131.

The alignment layer 132 is formed on an inner surface of the cavity ofthe capsular structure 131. The alignment layer 132 is disposed on anupper surface of the base substrate 101 on which the first, second andthird pixel electrodes PE1, PE2 and PE3 are formed. The cavity of thecapsular structure 131 has the inner surface including an inner uppersurface and an inner side surface.

The liquid crystal layer 133 is disposed in the cavity defined by thecapsular structure 131. The liquid crystal layer 133 may be aligned bythe alignment layer 132.

The common electrode CE is formed on an outer surface of the capsularstructures 131. The common electrode CE may cover the entire basesubstrate 101. The common electrode CE may cover the outer surface ofthe capsular structures 131. The outer surface of the capsularstructures 131 may have an outer upper surface and an outer sidesurface.

The color filter layer 140 may include a plurality of color filters CF1,CF2 and CF3, a light blocking pattern BP and a planarizing layer 144.The color filters CF1, CF2 and CF3, the light blocking pattern BP andthe planarizing layer 144 may be formed on the capsular structure layer130.

The first, second and third color filters CF1, CF2 and CF3 correspond tothe first, second and third sub pixel regions PA1, PA2 and PA3 of eachof the unit pixel regions PUA, respectively.

The light blocking pattern BP blocks light. The light blocking patternBP may be interposed between adjacent color filters of the first, secondand third color filters CF1, CF2 and CF3.

The planarizing layer 144 may be disposed on the first, second and thirdcolor filters CF1, CF2 and CF3 and the light blocking pattern BP and mayplanarize a surface of the display apparatus.

The protecting layer 150 is formed on and protects the planarizing layer144 and protects the display apparatus and seals the liquid crystallayer 133 received in the cavity. The protecting layer 150 may have asingle layered structure including silicon nitride (SiNx).Alternatively, the protecting layer 150 may have a multilayeredstructure formed from different layers and using different processes.

According to an exemplary embodiment, the capsular structures 131 arearranged in the unit pixel regions PUA, respectively, so that openingratio of the display apparatus may be increased.

FIGS. 3A to 3E are cross-sectional views illustrating a method ofmanufacturing the display apparatus shown in FIGS. 1 and 2.

Referring to FIGS. 1, 2 and 3A, the TFT array layer 120 is formed on thebase substrate 101.

For example, the first metal layer is formed on the base substrate 101.The first metal layer is patterned and a first metal pattern is formedincluding the gate lines GL and the gate electrodes GE. The first metallayer may include chromium, aluminum, tantalum, molybdenum, titanium,tungsten, copper, silver, an alloy thereof, etc. Alternatively, thefirst metal layer may have a single layered structure or a multi-layeredstructure including at least two layers having different physicalcharacteristics.

The first insulating layer 121 is formed on the base substrate 101 onwhich the first metal pattern is formed. The first insulating layer 121may include silicon nitride (SiNx), silicon oxide (SiOx), etc. The firstinsulating layer 121 may have a single layered structure, amulti-layered structure formed from different materials and usingdifferent processes.

A semiconductor layer is formed on the base substrate 101 on which thefirst insulating layer 121 is formed. The semiconductor layer ispatterned such that active patterns of the switching elements TR areformed.

A second metal layer is formed on the base substrate 101 on which theactive patterns are formed. The second metal layer is patterned and asecond metal pattern is formed including the data lines DL, the sourceelectrodes SE and the drain electrodes DE. The second metal layer mayinclude chromium, aluminum, tantalum, molybdenum, titanium, tungsten,copper, silver, an alloy thereof, etc. Alternatively, the second metallayer may have a single layered structure or a multi-layered structureincluding at least two layers having different physical characteristics.

Alternatively, the active patterns and the second metal pattern may beformed using one slit mask.

The second insulating layer 123 is formed on the base substrate 101 onwhich the second metal pattern is formed. The second insulating layer123 may include silicon nitride (SiNx), silicon oxide (SiOx), etc. Thesecond insulating layer 123 may have a single layered structure, amulti-layered structure formed from different materials and usingdifferent processes.

The second insulating layer 123 is etched and the contact hole CHthrough which each of the drain electrodes DE is exposed is formed.

A pixel electrode layer is formed on the base substrate 101 on which thecontact hole CH is formed. The pixel electrode layer is patterned andthe pixel electrodes PE1, PE2 and PE3 are formed in the sub pixelregions. When the display apparatus is the transmissive type displayapparatus, the pixel electrode layer may include transparent conductivematerial. Examples of the transparent conductive material that may beused for the pixel electrode layer may include indium tin oxide (ITO),indium zinc oxide (IZO), etc. Alternatively, the display apparatus isthe reflective type display apparatus, and the pixel electrode layer mayinclude opaque conductive material such as aluminum, aluminum alloy,etc.

The third insulating layer 125 is formed on the base substrate 101 onwhich the pixel electrodes PE1, PE2 and PE3 are formed. The thirdinsulating layer 125 may include silicon nitride (SiNx), silicon oxide(SiOx), etc. The third insulating layer 125 may have a single layeredstructure, a multi-layered structure formed from different materials andusing different processes.

When the pixel electrodes PE1, PE2 and PE3 are formed on the basesubstrate 101, the TFT array layer 120 of the display apparatus may becompleted.

Referring to FIGS. 2 and 3B, a removing layer is formed on the basesubstrate 101 on which the TFT array layer 120 is formed. The removinglayer may include high polymer. Examples of the high polymer that can beused for the removing layer may include benzocyclobutene (BCB), acrylbased resin, etc. Alternatively, the removing layer may include variousmaterials that may be removable during the manufacturing process.

The removing layer is patterned and a plurality of removing patterns SPis formed. The removing patterns SP are extended in the second directionD2, and are arranged in the first direction. A side of each of theremoving patterns SP in the first direction D1 has substantially thesame length as a side of each of the unit pixel regions PUA in the firstdirection D1. The width of each of the removing patterns corresponds toa summation of the widths of the first, second and third sub pixelregions PA1, PA2 and PA3. For example, the width of each of the removingpatterns may be substantially the same as the summation of the widths ofthe first, second and third sub pixel regions PA1, PA2 and PA3.

A capsular insulating layer 131 a is formed on the base substrate 101 onwhich the removing patterns SP are formed. The capsular insulating layer131 a may include silicon nitride (SiNx), silicon oxide (SiOx), etc. Thecapsular insulating layer 131 may have a single layered structure, amulti-layered structure formed from different materials and usingdifferent processes.

A transparent conductive layer CEa is formed on the base substrate 101on which the capsular insulating layer 131 a is formed. The transparentconductive layer CEa may include transparent conductive material.Examples of the transparent conductive material that may be used for thetransparent conductive layer CEa may include indium tin oxide (ITO),indium zinc oxide (IZO), etc.

Referring to FIGS. 2 and 3C, a first color photoresist layer is formedon the base substrate 101 on which the transparent conductive layer CEais formed. The first color photoresist layer is patterned through aphoto process and the first color filter CF1 is formed in the first subpixel region PA1 of the unit pixel region PUA. The first color filterCF1 has an island shape.

A second color photoresist layer is formed on the base substrate 101 onwhich the first color filter CF1 is formed. The second color photoresistlayer is patterned through a photo process and the second color filterCF2 is formed in the second sub pixel region PA2 of the unit pixelregion PUA. The second color filter CF2 has an island shape.

A third color photoresist layer is formed on the base substrate 101 onwhich the first and second color filters CF1 and CF1 are formed. Thethird color photoresist layer is patterned through a photo process andthe third color filter CF3 is formed in the third sub pixel region PA3of the unit pixel region PUA. The third color filter CF1 has an islandshape.

The first, second and third color filters CF1, CF2 and CF3 arediscontinuously formed in the second direction D2. Adjacent colorfilters of the first, second and third color filters CF1, CF2 and CF3may be partially overlapped with each other in the first direction D1.The first, second and third color filters CF1, CF2 and CF3 may be formedthrough various methods such as an inkjet printing.

A light blocking layer is formed on the base substrate 101 on which thefirst, second and third color filters CF1, CF2 and CF3 are formed. Thelight blocking layer is patterned and the light blocking pattern BP isformed. The light blocking layer may include opaque organic material,and may be patterned through a photo process. The light blocking patternBP may be overlapped with end portions of the first, second and thirdcolor filters CF1, CF2 and CF3 in the first direction D1.

The planarizing insulating layer 144 a is formed on the base substrate101 on which the light blocking pattern BP and the first, second andthird color filters CF1, CF2 and CF3 are formed. The planarizinginsulating layer 144 a planarizes an upper surface of the displayapparatus. The planarizing insulating layer 144 a may include siliconnitride (SiNx), silicon oxide (SiOx), etc. The planarizing insulatinglayer 144 a may have a single layered structure, a multi-layeredstructure formed from different materials and using different processes.

The planarizing insulating layer 144 a, the transparent conductive layerCEa and the capsular insulating layer 131 a are patterned through aphotolithography process and the planarizing layer 144, the commonelectrode CE and the capsular structures 131 that are extended in thefirst direction D1 are formed. For example, the planarizing layer 144,the common electrode CE and the capsular structures 131 are patterned insubstantially every column of the sub pixels so that the planarizinglayer 144, the common electrode CE and the capsular structures 131 areextended in the first direction D1 and arranged in the second directionD2.

The removing patterns SP are extended in the second direction D2 by theplanarizing layer 144, the common electrode CE and the capsularstructures 131 that are patterned in every column of the sub pixels, andare arranged in the first direction D1. The removing patterns SPpartially expose end portions of the sub pixel regions in the seconddirection. For example, the removing patterns SP partially expose aregion corresponding to the gate lines GL.

The planarizing layer 144 covers end portions of the color filters inthe second direction D2. The color filters are disposed in the sub pixelregions, respectively. Thus, the planarizing layer 144 protects thecolor filters CF1, CF2 and CF3 from the following step of removing theremoving patterns SP.

Referring to FIGS. 2 and 3D, the partially exposed removing patterns SPare removed through a plasma process. The removing patterns SP areremoved from the exposed end portions of the removing patterns SPthrough an anisotropic plasma process, so that the entire removingpatterns SP are removed. Thus, the removing patterns SP in the capsularstructures 131 are removed forming the cavities CA defined by thecapsular structures 131.

In an exemplary embodiment, the plasma process includes the anisotropicplasma process for removing the organic material. Alternatively, theplasma process may have various methods such as a microwave O₂ plasmaprocess. In the microwave O₂ plasma process, stage temperature, chamberpressure, and/or plasma gas may be adjusted and only the organicinsulating material may be removed. Thus, the third insulating layer125, the capsular structures 131 and the planarizing layer 144 includinginorganic material would not be removed during the microwave O₂ plasmaprocess. The microwave O₂ plasma process may be performed at atemperature of about 100° C. to about 300° C., an O₂ flow rate of about5,000 sccm to about 10,000 sccm, an N₂H₂ flow rate of about 100 sccm toabout 1,000 sccm, a chamber pressure of about 2 Torr, and an electricpower of about 100 W to about 4,000 W.

In an exemplary embodiment, the capsular structures 131 correspond tothe unit pixel regions, respectively, so that the cavities CA are formedin the unit pixel regions, respectively. Alternatively, each of thecapsular structures may correspond to two sub pixel regions, or each ofthe capsular structures may correspond to more than or equal to four subpixel regions. Also, each of the cavities may correspond to two subpixel regions, or each of the cavities may correspond to more than orequal to four sub pixel regions.

Referring to FIGS. 2 and 3E, the alignment layer 132 is formed on thebase substrate 101 on which the cavities CA are formed.

The alignment layer 132 is formed on the inner surface of the cavitiesCA that are defined by the capsular structures 131. For example, thealignment layer 132 is formed on the inner upper surface and the innerside surface of the capsular structures 131. The alignment layer 132 maybe formed using an alignment liquid. The alignment liquid may be formedby mixing alignment material with solvent. For example, the alignmentmaterial may include polyimide. The alignment liquid has fluidity. Thus,when the alignment liquid is transported adjacent to the capsularstructures 131, the alignment liquid moves in the cavities CA by acapillary phenomenon. The alignment liquid may be transported adjacentto the capsular structures 131 through an inkjet printing process usinga micropipette, and the alignment liquid may be injected into thecavities CA through a vacuum injection. The solvent is removed from thealignment liquid in the cavities CA. The solvent may be removed througha heating process or drying at a room temperature.

The liquid crystal layer 133 is formed on the base substrate 101 havingthe alignment layer 132. The liquid crystals are transported adjacent tothe capsular structures 131, and the liquid crystals move in thecavities CA by the capillary phenomenon. The liquid crystals may betransported adjacent to the capsular structures 131 through the inkjetprinting process using the micropipette, and the liquid crystals may beinjected into the cavities through a vacuum injection. For example, aportion of the base substrate 101 having the cavities CA of the capsularstructures 131 is dipped in the liquid crystals received in a container,and a chamber in which the base substrate 101 and the liquid crystals isdecompressed. Thus, the liquid crystals are injected in the cavities CAthrough the capillary phenomenon.

The protecting layer 150 is formed surrounding the liquid crystal layer133 that is filled in the cavities CA of the capsular structures 131.The protecting layer 150 seals an inlet of the cavities CA through whichthe liquid crystals are injected.

Alternatively, a first polarizer (not shown) having a first polarizingaxis may be formed on a lower substrate of the base substrate 101. Asecond polarizer (not shown) having a second polarizing axissubstantially perpendicular to the first polarizing axis may be formedon an upper surface of the protecting layer 150.

FIG. 4A is a cross-sectional view illustrating a display apparatus andlight transmittance of the display apparatus according to an exemplaryembodiment of the present invention. FIG. 4B is a cross-sectional viewillustrating the display apparatus shown in FIGS. 1 and 2 and lighttransmittance of the display apparatus shown in FIGS. 1 and 2.

Referring to FIG. 4A, the display apparatus includes a plurality ofcapsular structures arranged in a plurality of sub pixel regions,respectively. Each of the capsular structures may have a tunnel shape.In FIG. 4A, first, second and third capsular structures 231, 232 and 233are disposed in first, second and third sub pixel regions PA1, PA2 andPA3, respectively.

The light blocking patterns BP are disposed between the first and secondcapsular structures 231 and 232 corresponding to the first and secondsub pixel regions PA1 and PA2, between the second and third capsularstructures 232 and 233 corresponding to the second and third sub pixelregions PA2 and PA3, and the first and third capsular structures 231 and233 corresponding to the first and third sub pixel regions PA1 and PA3.

In FIG. 4A, the light blocking patterns BP have same shape and size, sothe size of the light blocking patterns BP is increased. For example,the first and second capsular structures 231 and 232 are spaced apartfrom each other, so that size of a light blocking region ‘A’corresponding to the light blocking patterns BP is increased. Thus, afirst opening region B of the second sub pixel region PA2 is decreasedby the first light blocking region ‘A’ having the increased size.

Referring to FIG. 4B, the display apparatus includes a plurality ofcapsular structures arranged in a plurality of unit pixel regions,respectively. Each of the unit pixel regions includes first, second andthird sub pixel regions PA1, PA2 and PA3. The capsular structures aredisposed in the unit pixel regions, respectively.

The light blocking patterns BP are disposed on longitudinal sides of thefirst, second and third sub pixel regions PA1, PA2 and PA3. For example,a portion of the light blocking patterns BP are disposed between thefirst and second sub pixel regions PA1 and PA2, and between the secondand third sub pixel regions PA2 and PA3. A remaining portion of thelight blocking pattern BP is disposed between the first sub pixel regionPA1 of the unit pixel region PUA and a third sub pixel region ofadjacent unit pixel region.

In FIG. 4B, the light blocking patterns BP disposed between the firstand second sub pixel regions PA1 and PA2 and between the second andthird sub pixel regions PA2 and PA3 are different from the lightblocking pattern BP disposed between the first sub pixel region PA1 ofthe unit pixel region PUA and the third sub pixel region of the adjacentunit pixel region. The size of a second light blocking region A′ betweenthe first and second sub pixel regions PA1 and PA2 and between thesecond and third sub pixel regions PA2 and PA3 is smaller than the lightblocking region A (shown in FIG. 4A). Thus, a second opening ratio B′ inthe second sub pixel region B′ is greater than the first opening ratio B(shown in FIG. 4A).

Therefore, the capsular structures are disposed between adjacent unitpixel regions each of which having a plurality of the sub pixel regions,so that the opening ratio of the sub pixel regions may be increased.Thus, opening ratio of the display apparatus may be increased.

FIG. 5 is a cross-sectional view illustrating a display apparatusaccording to an exemplary embodiment of the present invention.

A display apparatus according to an exemplary embodiment issubstantially the same as the display substrate discussed above withrespect to FIGS. 1 and 2 excepting for first and second light blockingpatterns BP1 and BP2, and thus the same reference numerals may be usedto refer to the same or like parts as those described above with respectto FIGS. 1 and 2 and any repetitive explanation concerning the aboveelements may be omitted.

Referring to FIGS. 1 and 5, the display apparatus includes a basesubstrate 101, a thin film transistor (TFT) array layer 120, a capsularstructure layer 130, a color filter layer 140 and a protecting layer150. The TFT array layer 120, the capsular structure layer 130, thecolor filter layer 140 and the protecting layer 150 are formed on thebase substrate 101. The TFT array layer 120, the capsular structurelayer 130, the color filter layer 140 and the protecting layer 150 ofFIG. 5 are substantially the same as those shown in FIGS. 1 and 2, andthus any repetitive explanation concerning the above elements may beomitted.

The color filter layer 140 may include a first light blocking patternBP1, a plurality of color filters CF1, CF2 and CF3, a second lightblocking pattern BP2 and a planarization layer 144. The color filterlayer 140 may further include a plurality of the first light blockingpatterns BP1 and a plurality of the second light blocking patterns BP1The color filter layer 140 may be disposed on the capsular structurelayer 130. The color filters CF1, CF2 and CF3 and the planarizationlayer 144 are substantially the same as those shown in FIGS. 1 and 2,and thus any repetitive explanation concerning the above elements may beomitted.

The first light blocking pattern BP1 is disposed between adjacentcapsular structures 131 corresponding to unit pixel regions PUA,respectively. For example, the first light blocking pattern BP1 isdisposed between a first sub pixel region PA1 of a first unit pixelregion PUA1 and a third sub pixel region PA3 of a second sub pixelregion PUA2 adjacent to the first unit pixel region PUA1.

The second light blocking patterns BP2 are disposed on the capsularstructures 131. The second light blocking patterns BP2 are disposed inthe unit pixel region PUA1 and PUA2, and are disposed between the subpixel regions PA1, PA2 and PA3. For example, the second light blockingpatterns BP2 are between the first and second sub pixel regions PA1 andPA2 and between the second and third sub pixel regions PA2 and PA3.

FIGS. 6A and 6B are cross-sectional views illustrating the displayapparatus shown in FIG. 5. A method according to an exemplary embodimentis substantially the same as the method discussed above with respect toFIGS. 1 to 3E excepting for first and second light blocking patterns BP1and BP2, and thus the same reference numerals may be used to refer tothe same or like parts as those described with respect to FIGS. 1 to 3Eand any repetitive explanation concerning the above elements may beomitted.

Referring to FIGS. 1, 5 and 6A, the TFT array layer 120 is formed on thebase substrate 101.

A plurality of removing patterns SP, a capsular structure layer 131 aand a transparent conductive layer CEa are formed on the TFT array layer120.

A first light blocking layer is formed on the base substrate 101 onwhich the transparent conductive layer CEa is formed. The first lightblocking layer is patterned and the first light blocking patterns BP1are formed. The first light blocking layer may include opaque organicmaterial, and may be patterned through a photo process. The first lightblocking patterns BP1 are disposed between adjacent capsular structures131 disposed in the unit pixel regions PUA, respectively. For example,the first light blocking patterns VP1 are disposed between the first subpixel region PA1 of the first unit pixel region PUA1 and the third subpixel region PA3 of the second unit pixel region PUA2 adjacent to thefirst unit pixel region PUA1.

Referring to FIGS. 5 and 6B, first, second and third color filters CF1,CF2 and CF3 are formed in the first, second and third sub pixel regionsPA1, PA2 and PA3, respectively, on the base substrate 101 on which thefirst light blocking patterns BP1 are formed.

A second light blocking layer is formed on the base substrate 101 onwhich the first, second and third color filters CF1, CF2 and CF3 areformed. The second light blocking layer is patterned and the secondlight blocking patterns BP2 are formed. The second light blocking layermay include opaque organic material, and may be patterned through aphoto process.

The second light blocking patterns BP2 are disposed on the capsularinsulating layer 131 a. The second light blocking patterns BP2 arespaced apart from each other. For example, the second light blockingpatterns BP2 are disposed between the first and second sub pixel regionsPA1 and PA2, and between the second and third sub pixel regions PA2 andPA3.

The planarizing layer 144 a is formed on the base substrate 101 on whichthe second light blocking patterns BP2 are formed.

Subsequent processes for manufacturing the display apparatus of FIG. 5are substantially the same as shown in FIGS. 3D and 3E. Thus, anyrepetitive explanations concerning the processes may be omitted.

According to an exemplary embodiment, the capsular structures 131 aredisposed in the unit pixel regions, respectively, so that opening ratioof the sub pixel region may be increased. Thus, the opening ratio of thedisplay apparatus may be increased.

FIG. 7 is a cross-sectional view illustrating a display apparatusaccording to an exemplary embodiment of the present invention.

A display apparatus according to an exemplary embodiment issubstantially the same as the display substrate according to theprevious exemplary embodiment of FIGS. 1 and 2 excepting for lightblocking patterns, and thus the same reference numerals may be used torefer to the same or like parts as those described in the previousexemplary embodiment of FIGS. 1 and 2 and any repetitive explanationconcerning the above elements may be omitted.

Referring to FIGS. 1 and 7, the display apparatus includes a basesubstrate 101, a thin film transistor (TFT) array layer 120, a capsularstructure layer 130, a color filter layer 140 and a protecting layer150. The TFT array layer 120, the capsular structure layer 130, thecolor filter layer 140 and the protecting layer 150 are formed on thebase substrate 101.

The TFT array layer 120 includes a plurality of gate lines GL, aplurality of data lines DL, a plurality of switching elements TR, aplurality of pixel electrodes PE and a plurality of light blockingpatterns BP. The gate lines GL, the data lines DL, the switchingelements TR and the pixel electrodes PE are substantially the same asthose shown in FIGS. 1 and 2, and thus any repetitive explanationconcerning the above elements may be omitted.

The light blocking patterns BP are disposed on the base substrate 101 onwhich the pixel electrodes PE are formed. The light blocking patterns BPare disposed between adjacent pixel electrodes PE1, PE2 and PE3. Forexample, the light blocking patterns BP are disposed in a region inwhich the data lines DL and the gate lines GL are formed. The lightblocking patterns BP may be overlapped with the data and gate lines DLand GL.

The capsular structure layer 130, the color filter layer 140 and theprotecting layer 150 may be formed on the base substrate 101 on whichthe light blocking patterns BP are formed.

The capsular structure layer 130, the color filter layer 140 and theprotecting layer 150 are substantially the same as shown in FIGS. 1 and2, and thus any repetitive explanations concerning the elements may beomitted.

FIGS. 8A to 8C are cross-sectional views illustrating the displayapparatus shown in FIG. 7. A method according to an exemplary embodimentis substantially the same as of the method discussed above with respectto FIGS. 1 to 3E excepting for light blocking patterns BP, and thus thesame reference numerals may be used to refer to the same or like partsas those described above with respect to FIGS. 1 to 3E and anyrepetitive explanation concerning the above elements may be omitted.

Referring to FIGS. 1, 7 and 8A, the TFT array layer 120 is formed on thebase substrate 101.

For example, a first metal pattern including the gate lines GL and gateelectrodes GE is formed on the base substrate 101. A first insulatinglayer 121 is formed on the base substrate 101 on which the first metalpattern is formed. Active patterns of the switching elements TR areformed on the base substrate 101 on which the first insulating layer 121is formed. A second metal pattern including the data lines DL, sourceelectrodes SE and drain electrodes DE is formed on the base substrate101 on which the active patterns are formed. A second insulating layer123 having contact holes CH is formed on the base substrate 101 on whichthe second metal pattern is formed. The first, second and third pixelelectrodes PE1, PE2 and PE3 are formed in the first, second and thirdsub pixel regions, respectively, on the base substrate 101 on which thesecond insulating layer 123 having the contact holes CH are formed.

A light blocking layer is formed on the base substrate 101 on which thefirst, second and third pixel electrodes PE1, PE2 and PE3 are formed.The light blocking layer may include metal, and may be patterned througha photolithography process. The light blocking layer is patternedforming the light blocking patterns BP between the first, second andthird pixel electrodes PE1, PE2 and PE3. The light blocking patterns BPmay be formed in a region between adjacent pixel electrodes in a firstdirection D1. Alternatively, the light blocking patterns BP may beformed in a region between adjacent pixel electrodes in a seconddirection D2 crossing the first direction D1.

A third insulating layer 125 is formed on the base substrate 101 onwhich the light blocking patterns BP are formed. Thus, the TFT arraylayer 120 is completed.

Referring to FIGS. 7 and 8B, a plurality of removing patterns SP, aplurality of capsular structures 131 a and a transparent conductivelayer CEa are shown.

Referring to FIGS. 7 and 8C, the first, second and third color filtersCF1, CF2 and CF3 are formed in the first, second and third sub pixelregions PA1, PA2 and PA3, respectively, on the base substrate 101 onwhich the transparent conductive layer CEa is formed.

A planarizing insulating layer 144 a is formed on the base substrate 101on which the first, second and third color filters CF1, CF2 and CF3 areformed.

Subsequent processes for manufacturing the display apparatus of FIG. 7are substantially the same as shown in FIGS. 3D and 3E. Thus, anyrepetitive explanations concerning the processes may be omitted.

According to an exemplary embodiment of the present invention, aplurality of the capsular structures is formed on the pixel regions, andeach of the capsular structures is formed on a plurality of the subpixel regions so that opening ratio is increased. Thus, lighttransmittance and luminance of the display apparatus may be increased.

The foregoing is illustrative of the present invention and is not to beconstrued as limiting thereof. Although a few exemplary embodiments ofthe present invention have been described, those skilled in the art willreadily appreciate that many modifications are possible in the exemplaryembodiments without materially departing from the novel teachings andaspects of the present invention.

What is claimed is:
 1. A display apparatus comprising: a base substratecomprising a plurality of unit pixel regions, each unit pixel region ofthe plurality of unit pixel regions comprising a plurality of sub pixelregions; a pixel electrode formed in each of the sub pixel regions ofthe plurality of sub pixel regions for each unit pixel region of theplurality of unit pixel regions; a plurality of capsular structuresdisposed on the base substrate, each capsular structure of the pluralityof capsular structures being formed in each of the unit pixel regions ofthe plurality of unit pixel regions, each capsular structure of theplurality of capsular structures having a cavity; a common electrodeformed on the plurality of capsular structures; and a plurality of colorfilters formed on the plurality of capsular structures, each of thecolor filters of the plurality of color filters being formed in each ofthe sub pixel regions of the plurality of sub pixel regions for eachunit pixel region of the plurality of unit pixel regions.
 2. The displayapparatus of claim 1, further comprising a light blocking pattern formedbetween adjacent color filters of the plurality of color filters.
 3. Thedisplay apparatus of claim 2, wherein the light blocking patterncomprises opaque organic material.
 4. The display apparatus of claim 3,wherein the light blocking pattern is disposed on the plurality of colorfilters.
 5. The display apparatus of claim 3, wherein the light blockingpattern comprises: a first black matrix interposed between adjacentcapsular structures of the plurality of capsular structures, and beingpartially overlapped with the plurality of color filters, the firstblack matrix being disposed under the plurality of color filters; and asecond black matrix formed on the plurality of capsular structures, andbeing partially overlapped with the plurality of color filters, thesecond black matrix being disposed on top of the plurality of colorfilters.
 6. The display apparatus of claim 2, wherein the light blockingpattern is interposed between the plurality of capsular structures andthe base substrate.
 7. The display apparatus of claim 6, wherein thelight blocking pattern comprises a metal.
 8. The display apparatus ofclaim 2, wherein each of the sub pixel regions of the plurality of subpixel regions in each of the unit pixel regions of the plurality of unitpixel regions are arranged in a first direction, and the commonelectrode is extended in the first direction and arranged in a seconddirection different than the first direction.
 9. The display apparatusof claim 8, wherein each of the plurality of capsular structuresadjacent to each other in the first direction are connected to eachother, and each of the plurality of capsular structures adjacent to eachother in the second direction are spaced apart from each other.
 10. Thedisplay apparatus of claim 2, further comprising: an alignment layerdisposed on an upper surface of the cavity of each capsular structure ofthe plurality of capsular structures; and a liquid crystal layerdisposed in the cavity of each capsular structure of the plurality ofcapsular structures and aligned by the alignment layer.
 11. The displayapparatus of claim 10, further comprising a protecting layer sealing theliquid crystal layer.
 12. A method of manufacturing a display apparatus,the method comprising: forming a plurality of pixel electrodes in aplurality of sub pixel regions of a base substrate; forming a removingpattern in each of a plurality of unit pixel regions, each of the unitpixel regions comprising a plurality of the sub pixel regions of theplurality of sub pixel regions of the base substrate, the removingpattern having substantially the same width as each of the unit pixelregions of the plurality of unit pixel regions, the removing patternbeing extended in a longitudinal direction that crosses a horizontaldirection of each of the unit pixel regions of the plurality of unitpixel regions; forming a plurality of capsular structures and a commonelectrode on the removing pattern of each of the plurality of unit pixelregions, each of the plurality of capsular structures being extended ina width direction of the removing pattern and spaced apart from eachother in the longitudinal direction of the removing pattern; removingthe removing patterns and forming cavities in each of the plurality ofcapsular structures; forming a liquid crystal layer in each of thecavities of each of the plurality of capsular structures; and forming aprotecting layer and sealing the liquid crystal layer in each of thecavities of each of the plurality of capsular structures.
 13. The methodof claim 12, further comprising forming a plurality of color filters onthe plurality of capsular structures, the plurality of color filterscorresponding to the plurality of sub pixel regions for each unit pixelregion of the plurality of unit pixel regions.
 14. The method of claim13, further comprising forming a light blocking pattern between adjacentcolor filters of the plurality of color filters having different colors.15. The method of claim 14, wherein the light blocking pattern comprisesan opaque organic material.
 16. The method of claim 15, wherein thelight blocking pattern is formed on the plurality of color filters, andis partially overlapped with the plurality of color filters.
 17. Themethod of claim 15, wherein the light blocking pattern is formed by:forming a first black matrix between adjacent capsular structures of theplurality of capsular structures prior to forming the plurality of colorfilters; and forming a second black matrix on the plurality of capsularstructures after forming the plurality of color filters.
 18. The methodof claim 12, further comprising forming a light blocking pattern, priorto forming the pixel electrodes.
 19. The method of claim 18, wherein thelight blocking pattern comprises a metal.
 20. The method of claim 12,further comprising: forming an alignment layer in each of the cavitiesof each of the plurality of capsular structures; and forming a lightcrystal layer in each of the cavities each of the plurality of capsularstructures in which the alignment layer is formed.
 21. A displayapparatus comprising: a base substrate, a plurality of unit pixelregions being defined on the base substrate; a plurality of pixelelectrode corresponding to the plurality of unit pixel regions, each ofthe unit pixel regions having a plurality of sub pixel regions; aplurality of capsular structures disposed on the base substrate, eachcapsular structure of the plurality of capsular structures being formedin each of the plurality of unit pixel regions, each capsular structureof the plurality of capsular structures having a cavity; a commonelectrode formed on the plurality of capsular structures; and aplurality of color filters formed on the plurality of capsularstructures, each of the color filters of the plurality of color filtersbeing formed in each of the sub pixel regions of the plurality of subpixel region.